الفهرس 
chapter 1Only 14 pages are availabe for public view
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Abstract
Transparent conducting oxide (TCO) films have much attention due to their various technological applications including solar cells, flat panel displays, light emitting diodes and gas sensors. Among TCO materials, TiO2 films are considered as important optical films due to their high refractive index, high band gap and transparency over a wide spectral range, adjustable electrical conductivity, perfect chemical stability and environmental nontoxicity. TiO2 has four known structures under ambient conditions: rutile, anatase, brookite and srilankite. The rutile structure is the most stable phase. As well known, there are a variety of chemical and physical methods were used to obtain TiO2 thin films with different structures for many applications. There are many research and manufacturing sectors prefer to use the physical vapor deposition (PVD) techniques in the deposition process of ceramic coatings for multiple applications. Pulsed magnetron sputtering is a modern PVD process and largely engaged for industrial application due its major advantage of low target poisoning; which preventing arcing and producing high quality film beside the relatively high deposition rate and good adhesion to different metallic and nonmetallic substrates.