الفهرس 
Basic fundament on plasma technology and depositionOnly 14 pages are availabe for public view
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Abstract
In the present work, a plasma coaxial discharge system has been
used with a new method for studying the deposition applications using
different materials include gas, liquid, and different powders, to get a thin film. The new in the present study is that the depositing material has been placed at the breach. The discharge current and voltage were measured. The first peak current reached 18 kA after 11 ps at 6 1W capacitor bank charging voltage. The deposited energy was 0.36 Id/pulse at 6 1W charging voltage for air at 0.2 Ton pressure while the maximum peak power achieved was 40 MW.The electron temperature and plasma density which has been measured by using double electric probe were found to be 12 eV and 1.7 x io’~ ion/cm3 ,respectively at 6kV charging voltage for air at 2 Ton pressure. While the electron temperature which has been measured by spectroscopic techniques was found to be 17.7 eV for air and about 0.8 eV for butane gas.
The plasma sheath velocity measured by magnetic probe has been
found in the order of io6 cmis , while that the double electric probe
measurements has shown that some portion of the plasma has been
created at higher position in front of the breach.A new model (MASOUD MODEL) describing the plasma focus system was made. This model overcome some troubleshooting appeared in Lee model, which namely; the non continuity in the calculated plasma velocity between the axial phase and the radial phase, the non realistic.